Continuous and high-throughput nanopatterning methodologies based on mechanical deformation
- Journal
- Journal of Materials Chemistry C
- Vol. (No.), pp.
- 1 (46), 7681-7691 (Jul 2013)
- Year
- 2014-
This feature article provides an overview of several mechanical-based micro- and nanopatterning technologies that can achieve continuous and high-throughput fabrication of various sub-wavelength structures without resorting to the conventional optical lithography technique. These include a template-based and versatile roll-to-roll nanoimprint lithography technique, cost-effective dynamic mould sweeping patterning as well as mould-free patterning methods. Examples of demonstrated and potential applications in optoelectronics and photonics are also discussed.
